Method and apparatus for fine processing

Details Method and apparatus for fine processing Method and apparatus for fine processing

1993-12-09

1995-04-25

Kight, III, John

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430325, 430326, 430327, 430945, 56646, 56625, 56345, 56643, G03C 500

Patent

active

054098025

ABSTRACT:
A method for fine processing includes a first step in which a first reaction gas is introduced into a reaction chamber which contains a material to be processed, followed by irradiation with light to form an active layer on the surface of the material through photochemical reaction between the material and the first reaction gas, a second step in which the active layer is selectively irradiated with energy in an atmosphere of a second reaction gas to cause a chemical change only in the irradiated portion to form a latent image layer, a third step in which either the latent image layer or active layer is removed and a fourth step in which, using the portion left unremoved in the third step as a shield mask, the portion other than the masked portion is etched.

REFERENCES:
patent: 4761199 (1988-08-01), Sato
patent: 4960675 (1990-10-01), Tsuo et al.
patent: 5024716 (1991-06-01), Sato
patent: 5024724 (1991-06-01), Hirono et al.

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