Method and apparatus for EUV plasma source target delivery

Radiant energy – Radiant energy generation and sources

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S50400H, C250S492200, C222S591000

Reexamination Certificate

active

07405416

ABSTRACT:
An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.

REFERENCES:
patent: 2759106 (1956-08-01), Wolter
patent: 3150483 (1964-09-01), Mayfield et al.
patent: 3232046 (1966-02-01), Meyer
patent: 3279176 (1966-10-01), Boden
patent: 3746870 (1973-07-01), Demarest
patent: 3960473 (1976-06-01), Harris
patent: 3961197 (1976-06-01), Dawson
patent: 3969628 (1976-07-01), Roberts et al.
patent: 4042848 (1977-08-01), Lee
patent: 4088966 (1978-05-01), Samis
patent: 4143275 (1979-03-01), Mallozzi et al.
patent: 4162160 (1979-07-01), Witter
patent: 4203393 (1980-05-01), Giardini
patent: 4364342 (1982-12-01), Asik
patent: 4369758 (1983-01-01), Endo
patent: 4504964 (1985-03-01), Cartz et al.
patent: 4507588 (1985-03-01), Asmussen et al.
patent: 4536884 (1985-08-01), Weiss et al.
patent: 4538291 (1985-08-01), Iwamatsu
patent: 4561406 (1985-12-01), Ward
patent: 4596030 (1986-06-01), Herziger et al.
patent: 4618971 (1986-10-01), Weiss et al.
patent: 4626193 (1986-12-01), Gann
patent: 4633492 (1986-12-01), Weiss et al.
patent: 4635282 (1987-01-01), Okada et al.
patent: 4751723 (1988-06-01), Gupta et al.
patent: 4752946 (1988-06-01), Gupta et al.
patent: 4774914 (1988-10-01), Ward
patent: 4837794 (1989-06-01), Riordan et al.
patent: 4928020 (1990-05-01), Birx et al.
patent: 5023897 (1991-06-01), Neff et al.
patent: 5027076 (1991-06-01), Horsley et al.
patent: 5102776 (1992-04-01), Hammer et al.
patent: 5126638 (1992-06-01), Dethlefsen
patent: 5142166 (1992-08-01), Birx
patent: 5171360 (1992-12-01), Orme et al.
patent: 5175755 (1992-12-01), Kumakhov
patent: 5226948 (1993-07-01), Orme et al.
patent: 5259593 (1993-11-01), Orme et al.
patent: 5313481 (1994-05-01), Cook et al.
patent: 5319695 (1994-06-01), Itoh et al.
patent: 5340090 (1994-08-01), Orme et al.
patent: RE34806 (1994-12-01), Cann
patent: 5411224 (1995-05-01), Dearman et al.
patent: 5448580 (1995-09-01), Birx et al.
patent: 5504795 (1996-04-01), McGeoch
patent: 5729562 (1998-03-01), Birx et al.
patent: 5763930 (1998-06-01), Partlo
patent: 5866871 (1999-02-01), Birx
patent: 5894980 (1999-04-01), Orme-Marmarelis et al.
patent: 5894985 (1999-04-01), Orme-Marmarelis et al.
patent: 5936988 (1999-08-01), Partlo et al.
patent: 5938102 (1999-08-01), Muntz et al.
patent: 5963616 (1999-10-01), Silfvast et al.
patent: 5970076 (1999-10-01), Hamada
patent: 6031241 (2000-02-01), Silfvast et al.
patent: 6031598 (2000-02-01), Tichenor et al.
patent: 6039850 (2000-03-01), Schulz
patent: 6051841 (2000-04-01), Partlo
patent: 6064072 (2000-05-01), Partlo et al.
patent: 6172324 (2001-01-01), Birx
patent: 6186192 (2001-02-01), Orme-Marmarelis et al.
patent: 6195272 (2001-02-01), Pascente
patent: 6224180 (2001-05-01), Pham-Van-Diep et al.
patent: 6264090 (2001-07-01), Muntz et al.
patent: 6276589 (2001-08-01), Watts, Jr. et al.
patent: 6285743 (2001-09-01), Kondo et al.
patent: 6307913 (2001-10-01), Foster et al.
patent: 6317448 (2001-11-01), Das et al.
patent: 6377651 (2002-04-01), Richardson et al.
patent: 6396900 (2002-05-01), Barbee, Jr. et al.
patent: 6452194 (2002-09-01), Bijkerk et al.
patent: 6452199 (2002-09-01), Partlo et al.
patent: 6491737 (2002-12-01), Orme-Marmerelis et al.
patent: 6493423 (2002-12-01), Bisschops
patent: 6520402 (2003-02-01), Orme-Marmerelis et al.
patent: 6562099 (2003-05-01), Orme-Marmerelis et al.
patent: 6566667 (2003-05-01), Partlo et al.
patent: 6566668 (2003-05-01), Rauch et al.
patent: 6576912 (2003-06-01), Visser et al.
patent: 6580517 (2003-06-01), Lokai et al.
patent: 6586757 (2003-07-01), Melnychuk et al.
patent: 6590959 (2003-07-01), Kandaka et al.
patent: 6647086 (2003-11-01), Amemiya et al.
patent: 6744060 (2004-06-01), Ness et al.
patent: 6804327 (2004-10-01), Schriever et al.
patent: 6815700 (2004-11-01), Melnychuk et al.
patent: 6855943 (2005-02-01), Shields
patent: 6865255 (2005-03-01), Richardson
patent: 6933515 (2005-08-01), Hartlove et al.
patent: 7122791 (2006-10-01), Joyce et al.
patent: 2003/0068012 (2003-04-01), Ahmad et al.
patent: 2003/0196512 (2003-10-01), Wyszomierski et al.
patent: 2003/0219056 (2003-11-01), Yager et al.
patent: 2005/0116985 (2005-06-01), Schurenberg
patent: 2006/0097145 (2006-05-01), Joyce et al.
patent: 2006/0097151 (2006-05-01), Seaward et al.
patent: 2006/0102663 (2006-05-01), McGeoch
patent: 2000091096 (2000-03-01), None
Andreev, et al., “Enhancement of laser/EUV conversion by shaped laser pulse interacting with Li-contained targets for EUV lithography”, Proc. OfSPIE, 5196:128-136, (2004).
Apruzese, J.P., “X-Ray Laser Research Using Z Pinches,”Am. Inst. of Phys. 399-403, (1994).
Bollanti, et al., “Compact Three Electrodes Excimer Laser IANUS for a POPA Optical System,”SPIE Proc. (2206) 144-153, (1994).
Bollanti, et al., “Ianus, the three-electrode excimer laser,”App. Phys. B(Lasers&Optics) 66(4):401-406, (1998).
Braun, et al., “Multi-component EUV Multilayer Mirrors,”Proc. SPIE, 5037:2-13, (2003).
Choi, et al., “A 1013A/s High Energy Density Micro Discharge Radiation Source,”B. Radiation Characteristics, p. 287-290.
Choi, et al., “Fast pulsed hollow cathode capillary discharge device,”Rev. of Sci. Instrum. 69(9):3118-3122 (1998).
Choi et al., Temporal development of hard and soft x-ray emission from a gas-puff Z pinch, Rev. Sci. Instrum. 57(8), pp. 2162-2164 (Aug. 1986).
H. Eichler, et al., “Phase conjugation for realizing lasers with diffraction limited beam quality and high average power,” Techninische Universitat Berlin, Optisches Institut, (Jun. 1998).
R. Fedosejevs and A. A. Offenberger, “Subnanosecond pulses from a KrF Laser pumped SF6Brillouin Amplifier”, IEEE J. QE 21, 1558-1562 (1985).
Feigl, et al., “Heat Resistance of EUV Multilayer Mirrors for Long-time Applications, ”Microelectric Engineering, 57-58:3-8, (2001).
Fomenkov, et al., “Characterization of a 13.5nm Source for EUV Lithography based on a Dense Plasma Focus and Lithium Emission,” Sematech Intl. Workshop on EUV Lithography (Oct. 1999).
Giordano and Letardi, “Magnetic pulse compressor for prepulse discharge in spiker-sustainer excitati technique for XeC1 lasers,” Rev. Sci. Instrum 65(8), pp. 2475-2481 (Aug. 1994).
Hansson, et al., “Xenon liquid jet laser-plasma source for EUV lithography,” Emerging Lithographic Technologies IV ,Proc. Of SPIE, vol. 3997:729-732 (2000).
Jahn, Physics of Electric Propulsion, McGraw-Hill Book Company, (Series in Missile and Space U.S.A.), Chap. 9, “Unsteady Electromagnetic Acceleration,” p. 257 (1968).
Shibin Jiang, et al., “Compact multimode pumped erbium-doped phosphate fiber amplifiers,” Optical Engineering, vol. 42, Issue 10, pp. 2817-2820 (Oct. 2003).
Kato, Yasuo, “Electrode Lifetimes in a Plasma Focus Soft X-Ray Source,”J. Appl. Phys. (33) Pt. 1, No. 8:4742-4744 (1991).
Kato, et al., “Plasma focus x-ray source for lithography,”Am. Vac. Sci. Tech. B., 6(1): 195-198 (1988).
K. Kuwahara et al., “Short-pulse generation by saturated KrF laser amplification of a steep Stokes pulse produced by two-step stimulated Brillouin scattering”, J. O

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for EUV plasma source target delivery does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for EUV plasma source target delivery, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for EUV plasma source target delivery will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2766028

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.