Method and apparatus for dry processing of substrates

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

156646, 156655, 1566591, 156668, 156345, 20419232, 204298, B44C 122, B29C 3700, C03C 1500, C03C 2506

Patent

active

046891129

ABSTRACT:
This invention relates to an apparatus and process for the uniform dry process treatment of the surface of a substrate. More particularly, the invention relates to an apparatus and process wherein a gas plasma composition having at least one reactive specie is supplied through a first inlet port into a chamber means containing the substrate to be treated. A second gas is also supplied into the chamber through a second inlet port thereby redirecting the gas plasma composition into contact with the substrate in a substantially uniform manner.

REFERENCES:
patent: 4579623 (1986-04-01), Suzuki et al.
patent: 4595452 (1986-06-01), Landau et al.
patent: 4612085 (1986-09-01), Jelks et al.
patent: 4615756 (1986-10-01), Tsujii et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for dry processing of substrates does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for dry processing of substrates, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for dry processing of substrates will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1921634

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.