Gas separation – Means within gas stream for conducting concentrate to collector
Patent
1989-02-27
1990-01-30
Spitzer, Robert
Gas separation
Means within gas stream for conducting concentrate to collector
55 68, 55158, B01D 5322
Patent
active
048970921
ABSTRACT:
The present invention is a class of polyimide membranes wherein the diamine portion of the polymer structure is an alkylated bisaniline. The bridging group of the diamine possesses restricted, rotatable rigid, or low Van Der Waal energy substituents which are orthogonal to the polymer backbone. These polyamide membranes exhibit enhanced gas flux and are useful in various gas separation applications.
REFERENCES:
patent: Re30351 (1980-07-01), Hoehn et al.
patent: 3822202 (1974-07-01), Hoehn et al.
patent: 4156597 (1979-05-01), Browall
patent: 4378400 (1983-03-01), Makino et al.
patent: 4440643 (1984-04-01), Makino et al.
patent: 4474662 (1984-10-01), Makino et al.
patent: 4512893 (1985-04-01), Makino et al.
patent: 4528004 (1985-07-01), Makino et al.
patent: 4690873 (1987-09-01), Makino et al.
patent: 4705540 (1987-11-01), Hayes
patent: 4717393 (1988-01-01), Hayes
patent: 4717394 (1988-01-01), Hayes
patent: 4746474 (1988-05-01), Kohn
patent: 4838900 (1989-06-01), Hayes
M. Salame, "Prediction of Gas Barrier Properties of High Polymers", Poly. Eng. Sci., vol. 26, pp. 1543-1546, No. 22 (1986).
P. H. Kim et al, "Reverse Permselectivity" of N.sub.2 over CH.sub.4 in Aromatic Polyimides, J. Appl. Poly. Sci., vol. 34, pp. 1767-1771 (1987).
Burgoyne, Jr. William F.
Langsam Michael
Air Products and Chemicals Inc.
Marsh William F.
Rodgers Mark L.
Simmons James C.
Spitzer Robert
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