Method and apparatus for dissolving a gas into a liquid for...

Details Method and apparatus for dissolving a gas into a liquid for... Method and apparatus for dissolving a gas into a liquid for...

2006-05-02

2006-05-02

Dang, Phuc T. (Department: 2818)

Semiconductor device manufacturing: process

Chemical etching

Having liquid and vapor etching steps

C438S727000, C438S907000

Reexamination Certificate

active

07037842

ABSTRACT:
A method and apparatus for processing a wafer is described. According to the present invention a wafer is placed on a substrate support. A liquid is then fed through a conduit having an output opening over the wafer. A gas is dissolved in the liquid prior to the liquid reaching the output over the wafer by flowing a gas into the conduit through a venturi opening formed in the conduit. The liquid with dissolved gas is then fed through the opening and onto the wafer where it can be used to etch, clean, or rinse a wafer.

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