Abrading – Precision device or process - or with condition responsive... – By optical sensor
Reexamination Certificate
2006-01-17
2006-01-17
Rose, Robert A. (Department: 3723)
Abrading
Precision device or process - or with condition responsive...
By optical sensor
C451S005000, C451S041000
Reexamination Certificate
active
06986699
ABSTRACT:
A chemical mechanical polishing apparatus includes a platen to support a polishing pad, and a polishing head to hold a substrate against the polishing pad during processing. The substrate includes a thin film structure disposed on a wafer. A first optical system includes a first light source to generate a first light beam which impinges on a surface of the substrate, and a first sensor to measure light reflected from the surface of the substrate to generate a measured first interference signal. A second optical system includes a second light source to generate a second light beam which impinges on a surface of the substrate and a second sensor to measure light reflected from the surface of the substrate to generate a measured second interference signal. The second light beam has a wavelength different from the first light beam.
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Birang Manoocher
Schoenleber Walter
Swedek Boguslaw
Wiswesser Andreas Norbert
Applied Materials Inc.
Fish & Richardson
Rose Robert A.
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