Method and apparatus for determining chamber cleaning end point

Details Method and apparatus for determining chamber cleaning end point Method and apparatus for determining chamber cleaning end point

1996-12-06

1998-01-27

Evans, F. L.

Optics: measuring and testing

By dispersed light spectroscopy

With sample excitation

356326, G01J 3443

Patent

active

057127026

ABSTRACT:
A marker element is included in a deposition chamber. After use of the chamber to deposit films or coatings on workpieces, the chamber is cleaned to remove materials which may contaminate future processing of workpieces in the chamber. The composition of the gas exhausted from the chamber during the cleaning process is monitored, and a characteristic of the marker element is sensed. The cleaning gas is terminated in response to the sensed characteristic of the marker element having a predetermined value, such as a peak intensity or the return to a baseline value after peaking. The present invention effectively solves the problem of overcleaning or undercleaning the chamber based upon an estimated film thickness build up.

REFERENCES:
patent: 4975141 (1990-12-01), Greco et al.
patent: 5261998 (1993-11-01), Kanetake et al.
patent: 5465154 (1995-11-01), Levy
patent: 5486235 (1996-01-01), Ye et al.
patent: 5536359 (1996-07-01), Kawada et al.

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