Method and apparatus for detecting contaminants in...

Thermal measuring and testing – Temperature measurement – Nonelectrical – nonmagnetic – or nonmechanical temperature...

Reexamination Certificate

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C374S005000, C374S021000

Reexamination Certificate

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06869215

ABSTRACT:
A method and apparatus for detecting contaminants in an ion-implanted wafer by annealing and activating the ion-implanted wafer by heating or charging or both, and measuring the thermal wave absorbance generated from the activated wafer.

REFERENCES:
patent: 4965451 (1990-10-01), Solter
patent: 5410162 (1995-04-01), Tigelaar et al.
patent: 5997175 (1999-12-01), Champetier et al.
patent: 6375348 (2002-04-01), Hebb et al.
patent: 20020090746 (2002-07-01), Xu et al.
patent: 1998-022840 (1998-07-01), None
patent: 1999-018615 (1999-03-01), None

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