Coating apparatus – Gas or vapor deposition
Reexamination Certificate
2006-07-04
2006-07-04
Zervigon, Rudy (Department: 1763)
Coating apparatus
Gas or vapor deposition
C118S665000, C118S688000, C156S345290, C156S345240
Reexamination Certificate
active
07070657
ABSTRACT:
This invention provides a stable process for depositing an antireflective layer. Helium gas is used to lower the deposition rate of plasma-enhanced silane oxide, silane oxynitride, and silane nitride processes. Helium is also used to stabilize the process, so that different films can be deposited. The invention also provides conditions under which process parameters can be controlled to produce antireflective layers with varying optimum refractive index, absorptive index, and thickness for obtaining the desired optical behavior.
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Cheung David
Feng Joe
Huang Judy H.
Yau Wai-Fan
Applied Materials Inc.
Townsend & Townsend & Crew
Zervigon Rudy
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