Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1996-11-07
1998-09-08
Padgett, Marianne
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
427122, 427249, 4272556, 4272557, 438780, 438784, 438763, 438584, H05H 124, B05D 512, H01L 2102, C23C 1600
Patent
active
058042598
ABSTRACT:
A method and apparatus for forming a multilayer insulating film on a substrate involves forming a number of carbon-based layers on the substrate, each interlaid with layers of organic material, such as parylene. Preferably, the carbon-based layers are formed using a high-density plasma chemical vapor deposition system, although other CVD systems may also be used. The result is a multilayer insulating film having a low overall dielectric constant, excellent gap-fill characteristics, and desirable thermal properties.
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Applied Materials Inc.
Padgett Marianne
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