Method and apparatus for controlling thickness of a layer of an

Details Method and apparatus for controlling thickness of a layer of an Method and apparatus for controlling thickness of a layer of an

1985-10-15

1987-06-30

Evans, F. L.

Optics: measuring and testing

By configuration comparison

With photosensitive film or plate

427 10, G01B 1102

Patent

active

046766464

ABSTRACT:
Disclosed is a method and apparatus for depositing material on a substrate by periodically measuring an optical property of a region thereof, thereby obtaining a substantially continuous profile of the property for that region. The measured value of the property is compared with a predetermined value, and when the two values are substantially equal, deposition is terminated, thereby resulting in correct and reproductible layer thicknesses.

REFERENCES:
patent: 3492491 (1970-01-01), Beeh
patent: 4457794 (1984-07-01), Kotera et al.

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