Electric heating – Heating devices – Combined with container – enclosure – or support for material...
Reexamination Certificate
2007-09-25
2007-09-25
Paik, Sang (Department: 3742)
Electric heating
Heating devices
Combined with container, enclosure, or support for material...
C118S724000
Reexamination Certificate
active
11001218
ABSTRACT:
A chuck for a plasma processor comprises a temperature-controlled base, a thermal insulator, a flat support, and a heater. The temperature-controlled base has a temperature below the desired temperature of a workpiece. The thermal insulator is disposed over the temperature-controlled base. The flat-support holds a workpiece and is disposed over the thermal insulator. A heater is embedded within the flat support and/or disposed on an underside of the flat support. The heater includes a plurality of heating elements that heat a plurality of corresponding heating zones. The power supplied and/or temperature of each heating element is controlled independently.
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Benjamin Neil
Steger Robert
Lam Research Corporation
Paik Sang
Thelen Reid Brown Raysman & Steiner LLP
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