Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Reexamination Certificate
2005-11-01
2005-11-01
McPherson, John A. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
C430S313000, C438S007000, C438S016000, C438S707000, C356S635000, C356S625000, C156S345240, C118S696000, C118S719000
Reexamination Certificate
active
06960416
ABSTRACT:
A method for controlling etch processes during fabrication of semiconductor devices comprises tests and measurements performed on non-product and product substrates to define an N-parameter CD control graph that is used to calculate a process time for trimming a patterned mask to a pre-determined width. An apparatus for performing such a method.
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Liu Wei
Mui David S L
Sasano Hiroki
Applied Materials Inc.
Bach Joseph
Chacko-Davis Daborah
McPherson John A.
Moser, Patterson & Sheridan, NJ.
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