Coating apparatus – Gas or vapor deposition
Patent
1995-05-25
1998-01-13
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
118 50, 118 501, 20429807, 20429833, C23C 1600
Patent
active
057074518
ABSTRACT:
An improved method of in-situ cleaning a throttle valve in a CVD device and exhaust flow control apparatus for facilitating such cleaning. The throttle valve is repositioned such that it is juxtaposed in close proximity to the exhaust gas port of the reaction chamber. A plasma is then ignited in a cleaning gas mixture of nitrogen trifluoride, hexafluoroethane and oxygen.
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Nguyen Bang C.
Pham Thanh
Robles Stuardo A.
Applied Materials Inc.
Breneman R. Bruce
Lund Jeffrie R.
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