Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate
Reexamination Certificate
2011-08-30
2011-08-30
Chen, Jack (Department: 2893)
Semiconductor device manufacturing: process
Formation of semiconductive active region on any substrate
C438S476000, C438S770000, C438S976000, C257SE21001
Reexamination Certificate
active
08008166
ABSTRACT:
The present invention generally provides apparatus and method for forming a clean and damage free surface on a semiconductor substrate. One embodiment of the present invention provides a system that contains a cleaning chamber that is adapted to expose a surface of substrate to a plasma cleaning process prior to forming an epitaxial layer thereon. In one embodiment, a method is employed to reduce the contamination of a substrate processed in the cleaning chamber by depositing a gettering material on the inner surfaces of the cleaning chamber prior to performing a cleaning process on a substrate. In one embodiment, oxidation and etching steps are repeatedly performed on a substrate in the cleaning chamber to expose or create a clean surface on a substrate that can then have an epitaxial placed thereon. In one embodiment, a low energy plasma is used during the cleaning step.
REFERENCES:
patent: 6042687 (2000-03-01), Singh et al.
patent: 6083323 (2000-07-01), Carlson et al.
patent: 6109206 (2000-08-01), Maydan et al.
patent: 6204120 (2001-03-01), Gilboa et al.
patent: 6207005 (2001-03-01), Henley et al.
patent: 6376387 (2002-04-01), Carlson et al.
patent: 6455814 (2002-09-01), Samoilov et al.
patent: 6478924 (2002-11-01), Shamouilian et al.
patent: 6494959 (2002-12-01), Samoilov et al.
patent: 6514886 (2003-02-01), U'Ren
patent: 6660659 (2003-12-01), Kraus et al.
patent: 6685779 (2004-02-01), Carlson et al.
patent: 6833322 (2004-12-01), Anderson et al.
patent: 6878636 (2005-04-01), Bailey et al.
patent: 7105449 (2006-09-01), Nozawa et al.
patent: 7132372 (2006-11-01), Smith et al.
patent: 7141514 (2006-11-01), Chua
patent: 2006/0057810 (2006-03-01), Smith et al.
patent: 2006/0105114 (2006-05-01), White
patent: 2006/0175613 (2006-08-01), Lee et al.
patent: 2006/0178018 (2006-08-01), Olsen
patent: 2006/0223315 (2006-10-01), Yokota et al.
patent: 2006/0258124 (2006-11-01), Singh et al.
patent: 2007/0026693 (2007-02-01), Yokota et al.
patent: 2009/0029528 (2009-01-01), Sanchez et al.
PCT International Search Report and Written Opinion dated Sep. 26, 2008 for International Application No. PCT/US2008/69430.
Carlson David K.
Doherty Roisin L.
Sanchez Errol Antonio C.
Swenberg Johanes
Applied Materials Inc.
Chen Jack
Patterson & Sheridan L.L.P.
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