Method and apparatus for cleaning a chamber

Details Method and apparatus for cleaning a chamber Method and apparatus for cleaning a chamber

1996-07-12

1999-05-11

Dang, Thi

Coating apparatus

Gas or vapor deposition

With treating means

156345, C23C16/00

Patent

active

059024038

ABSTRACT:
The present invention provides a method and apparatus for cleaning deposits in a chemical vapor deposition ("CVD") chamber equipped for generating a plasma. A gas supplying line is connected to the CVD chamber to deliver a cleaning gas that reacts with the deposits formed therein. When all of the deposits have been reacted and the chamber is clean, the pressure in the chamber will change, either increasing or decreasing. A pressure detector located beyond an adjustable valve in the exhaust line allows the reaction end point to be determined, while allowing the adjustable valve to maintain a constant pressure in the chamber itself.

REFERENCES:
patent: 5311452 (1994-05-01), Yokota et al.
patent: 5423936 (1995-06-01), Tomita et al.

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