X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1986-10-14
1988-10-11
Howell, Janice A.
X-ray or gamma ray systems or devices
Specific application
Lithography
378205, 2504911, G21K 500
Patent
active
047776412
ABSTRACT:
A method and apparatus for alignment for use in X-ray exposure or the like wherein a mask is provided having a formation of an alignment pattern made up of at least one linear segment formed in a peripheral section of the mask and a wafer is provided having a formation of an alignment pattern formed in a same direction as the alignment pattern of the mask and made up of linear segments. An illuminating arrangement illuminates a light to the mask alignment pattern along a direction inclined to the alignment direction and the mask alignment pattern and the wafer alignment pattern are imaged and transformed into a video signal. An A/D converts the video signal into a digital signal and stores the digital signal in a memory. The digital video signal is read out from the memory and averaged in a mask alignment pattern by removing a shadow portion caused by the mask alignment pattern and additionally averaged in a wafer alignment pattern area with an averaged wafer alignment pattern signal and an averaged wafer alignment pattern signal being provided. Relative displacement between the mask and the wafer is detected from the averaged mask alignment pattern signal and the averaged wafer alignment pattern signal and the mask and wafer are aligned by moving at least one of the mask and wafer so that displacement between the mask and the wafer does not exist.
REFERENCES:
patent: 4127777 (1978-11-01), Binder
patent: 4203123 (1980-05-01), Schmitt et al.
patent: 4326805 (1982-04-01), Feldman et al.
Funatsu Ryuichi
Inagaki Akira
Kembo Yukio
Komeyama Yoshihiro
Kuni Asahiro
Hitachi , Ltd.
Howell Janice A.
Porta David P.
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