Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1988-06-20
1990-10-23
Dees, Jose
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430313, 430314, 437196, 437203, 437226, 437228, 437946, G03C 500
Patent
active
049651730
ABSTRACT:
A metallizing system for silicon surfaces consists of sequential layers of nickel, chromium, nickel and silver. Approximately 2 microns of the silicon surface are removed prior to metallization to ensure removal of an oxygen-saturated layer of silicon before the first nickel layer is deposited. The assembly is heated sufficiently that the first nickel layer forms a nickel-silicide layer at the silicon surface. The metallizing adheres to bare treated silicon but does not adhere to adjacent oxide coatings and easily lifts off of oxide-coated surfaces. The metallizing is solderable, makes ohmic contact to the silicon, regardless of its conductivity type and survives subsequent alloy processing temperatures.
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Dees Jose
International Rectifier Corporation
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