Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2006-08-31
2009-06-02
Sefer, Ahmed (Department: 2893)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S396000, C257S401000, C257S288000, C257SE29021, C257SE29275, C257SE29298, C438S197000
Reexamination Certificate
active
07541645
ABSTRACT:
A unit cell of a metal oxide semiconductor (MOS) transistor is provided including an integrated circuit substrate and a MOS transistor on the integrated circuit substrate. The MOS transistor has a source region, a drain region and a gate. The gate is between the source region and the drain region. First and second spaced apart buffer regions are provided beneath the source region and the drain region and between respective ones of the source region and integrated circuit substrate and the drain region and the integrated circuit substrate.
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“Notice to File Response to a Rejection,” from the Korean Intellectual Property Office, corresponding to Korean Patent Application No. 2002-02995, dated Sep. 13, 2004.
Cho Hye-Jin
Choe Jeong-Dong
Kim Sung-Min
Lee Shin-Ae
Lee Sung-Young
Myers Bigel & Sibley & Sajovec
Samsung Electronics Co,. Ltd.
Sefer Ahmed
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