Metal organic chemical vapor deposition apparatus and deposition

Details Metal organic chemical vapor deposition apparatus and deposition Metal organic chemical vapor deposition apparatus and deposition

1997-09-02

1999-12-28

Bowers, Charles

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

118778, 118690, 118726, H01L 2131

Patent

active

060081430

ABSTRACT:
A metal organic chemical vapor deposition apparatus comprising a source ampule, a liquid micro-pump, a vaporizer equipped with a solvent supply means, and a reactor. A reactant dissolved in a solvent in the source ampule is transferred to the vaporizer by the liquid micro-pump. A sufficient amount of the solvent is additionally fed to the vaporizer by the solvent supply means, concurrently with the transfer, and vaporized along with the reactants. After being vaporized in the vaporizer, the reactant is injected to the reactor by carrier gas and deposited on a semiconductor substrate to form a high dielectric thin film. By virtue of the additional supplied solvent, the recondensation of the reactant in the vaporizer, which is attributed to the separation of the solvent from the reactant, can be prevented in the vaporizer and in the transfer line between the vaporizer and the reactor. In addition, the residues of the reactant, which may result from the separation, can be washed off by providing the solvent through the supply means to the vaporizer.

REFERENCES:
patent: 4954371 (1990-09-01), Yializis
patent: 5087485 (1992-02-01), Cho
patent: 5204314 (1993-04-01), Kirlin et al.
patent: 5362328 (1994-11-01), Gardiner et al.
patent: 5372850 (1994-12-01), Uchikawa et al.
patent: 5393564 (1995-02-01), Westmoreland et al.
patent: 5447569 (1995-09-01), Hiskes et al.
patent: 5458689 (1995-10-01), Saito
patent: 5460654 (1995-10-01), Kikkawa et al.
patent: 5540772 (1996-07-01), McMillan et al.
patent: 5555154 (1996-09-01), Uchikawa et al.
patent: 5711813 (1998-01-01), Kadoiwa et al.
patent: 5728222 (1998-03-01), Barbee et al.
patent: 5820678 (1998-10-01), Hubert

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