Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1997-07-29
2000-03-28
Duda, Kathleen
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430322, G03F 700
Patent
active
060430028
ABSTRACT:
The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a very low level of metal ions, utilizing a specially treated anion exchange resin. A method is also provided for producing photoresist composition having a very low level of metal ions from such novolak resins and for producing semiconductor devices using such photoresist compositions.
REFERENCES:
patent: 4033909 (1977-07-01), Papa
patent: 4636540 (1987-01-01), Warfel
patent: 5073622 (1991-12-01), Wojtech et al.
"Amberlite Ion Exchange Resins Laboratory Guide", Rohm and Haas Company, Philadelphia, PA, 19105, pp. 5-7, Sep. 1979.
Clariant Finance (BVI) Limited
Duda Kathleen
Sayko Jr Andrew F.
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