Metal-insulator-metal (MIM) capacitor and fabrication method...

Details Metal-insulator-metal (MIM) capacitor and fabrication method... Metal-insulator-metal (MIM) capacitor and fabrication method...

2005-12-20

2005-12-20

Tsai, H. Jey (Department: 2812)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

C438S253000, C438S393000, C438S396000

Reexamination Certificate

active

06977198

ABSTRACT:
A metal-insulator-metal (MIM) capacitor includes a first metal plate; a first capacitor dielectric layer disposed on the first metal plate and a second metal plate stacked on the first capacitor dielectric layer. The first metal plate, the first capacitor dielectric layer, and the second metal plate constitute a lower capacitor. A second capacitor dielectric layer is disposed on the second metal plate. A third metal plate is stacked on the second capacitor dielectric layer. The second metal plate, the second capacitor dielectric layer, and the third metal plate constitute an upper capacitor. The first metal plate and the third metal plate are electrically connected to a first terminal of the MIM capacitor, while the second metal plate is electrically connected to a second terminal of the MIM capacitor.

REFERENCES:
patent: 6066537 (2000-05-01), Poh
patent: 6232197 (2001-05-01), Tsai
patent: 6459117 (2002-10-01), Liou
patent: 6468858 (2002-10-01), Lou
patent: 6710425 (2004-03-01), Bothra
patent: 6777248 (2004-08-01), Nabatame et al.
patent: 6838717 (2005-01-01), Yen et al.

Affiliated with

Also associated with

Rating

Metal-insulator-metal (MIM) capacitor and fabrication method... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Metal-insulator-metal (MIM) capacitor and fabrication method..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Metal-insulator-metal (MIM) capacitor and fabrication method... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3506993