Metal-etching process

Details Metal-etching process Metal-etching process

1987-05-06

1990-02-20

Dees, Jose G.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430314, 430324, 430325, 430327, 430329, 430330, 156644, 1566591, 156664, 204 181, 204 23, 204 321, 4271266, G03C 500

Patent

active

049026070

ABSTRACT:
An improved metal etching process including preparation of a metal substrate, developing a photoresist on the substrate, coating the exposed substrate with electroless phosphorous nickel alloy, removing the developed photoresist and etching the then exposed substrate. The preparation for depositing the electroless nickel includes washing the surface of the substrate with a very dilute acidic ferric chloride solution, immersing the substrate in a hydrochloric acid solution, and applying a thin metal layer by electrolytic plating, seriatim.

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patent: 4640739 (1987-02-01), Modic et al.
patent: 4655884 (1987-04-01), Hills et al.

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