Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2006-03-14
2006-03-14
Le, Dung A. (Department: 2818)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S258000, C438S264000, C438S265000, C438S266000, C438S593000, C257S314000, C257S315000, C257S316000
Reexamination Certificate
active
07012003
ABSTRACT:
The invention relates to a method for producing a memory component comprising a memory location (104) having memory cells and first control electrode strips (162) for controlling the individual memory cells, and a peripheral area (106) having peripheral elements and second control electrode strips (164) for controlling said peripheral elements. The inventive method enables the expansion of the second control electrode strips (164) in the peripheral area (106) to be approximately randomly adjusted to minimum line widths, without influencing or changing the expansion of the first control electrode strips (162) in the memory location (104).
REFERENCES:
patent: 5289422 (1994-02-01), Mametani
patent: 5661053 (1997-08-01), Yuan
Infineon - Technologies AG
Le Dung A.
Morrison & Foerster / LLP
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