Memory device with quantum dot and method for manufacturing...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

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C257SE21179

Reexamination Certificate

active

11138691

ABSTRACT:
Provided is a memory device formed using quantum devices and a method for manufacturing the same. A memory device comprises a substrate; a source region and a drain region formed in the substrate so as to be separated from each other by a predetermined interval; a memory cell which is formed on the surface of the substrate to connect the source region and the drain region, and has a plurality of nano-sized quantum dots filled with material for storing electrons; and a control gate which is formed on the memory cell and controls the number of electrons stored in the memory cell. It is possible to embody a highly efficient and highly integrated memory device by providing a memory device having nano-sized quantum dots and a method for manufacturing the same.

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M. Ikeda et al., “Charge Injection of a Si Quantum Dot Floating Gate in MOS Structures,” Extended Abstracts of the 2001 International Conference on Solid State Devices and Materials, Sep. 26, 2001, pp. 308-309, vol. 2001, Tokyo, Japan.
F. Sabri et al., “Charge storage in GaAs metal insulator semiconductor field effect transistor metal nanodot memory structures,” Applied Physics Letters, American Insitute of Physics, May 17, 1999, pp. 2996-2998, vol. 74, No. 20, New York, US.

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