Memory cell having conductive sill

Active solid-state devices (e.g. – transistors – solid-state diode – Fet configuration adapted for use as static memory cell

Reexamination Certificate

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Details

C257SE27098

Reexamination Certificate

active

06914338

ABSTRACT:
A memory cell comprises a plurality of transistors. Each of the transistors include source/drain regions located in a substrate and a gate electrode located over the substrate between associated source/drain regions. The memory cell also includes at least one conductive sill contacting a source/drain region of a first one of the plurality of transistors and a gate electrode of a second one of the plurality of transistors.

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patent: 2003/0039146 (2003-02-01), Choi
patent: 2003/0042528 (2003-03-01), Forbes
patent: 2003/0043657 (2003-03-01), Shau

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