Membrane mask structure, fabrication and use

Details Membrane mask structure, fabrication and use Membrane mask structure, fabrication and use

1996-10-16

1998-07-14

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 35, G21K 510

Patent

active

057816077

ABSTRACT:
A membrane mask structure for lithography using a radiation source and steps for fabricating and using the inventive membrane mask structure. The membrane mask structure comprises the following: a support structure formed of a material which is opaque to the lithographic radiation source and comprising support members separated by window areas; a membrane layer overlaying said support members and window areas, said membrane layer comprised of material which is transparent to said radiation source; and a pattern of feature material formed on or embedded in the membrane layer, said feature material being opaque to the radiation source and said feature pattern aligning with the window areas of said support structure. The mask structure may additionally include a plurality of reference markers formed in or on said membrane layer or on said support members of said support structure. In addition, the mask structure may include a protective pellicle of radiation-transparent material, which pellicle is mounted on the surface of said support members not associated with said membrane layer in such a way as to prevent any debris from contacting the membrane areas on which the feature pattern is formed.

REFERENCES:
patent: 4587184 (1986-05-01), Schneider-Gmelch et al.
patent: 5111491 (1992-05-01), Imai et al.
patent: 5115456 (1992-05-01), Kimura et al.
patent: 5227268 (1993-07-01), Koga et al.
patent: 5235626 (1993-08-01), Flamholz et al.
patent: 5459001 (1995-10-01), Estes et al.
patent: 5572562 (1996-11-01), Rostoker et al.
patent: 5593800 (1997-01-01), Fukioka et al.
"X-Ray Exposure Mask", Patent Abstracts of Japan, Pub. No. 59002323, Jul. 01, 1984.

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