Cleaning and liquid contact with solids – Apparatus – With movable means to cause fluid motion
Reexamination Certificate
2006-03-28
2006-03-28
Stinson, Frankie L. (Department: 1746)
Cleaning and liquid contact with solids
Apparatus
With movable means to cause fluid motion
C134S186000, C134S902000
Reexamination Certificate
active
07017597
ABSTRACT:
A megasonic cleaning apparatus is provided for removing contamination particles on a wafer. The megasonic cleaning apparatus includes a piezoelectric transducer and an energy transfer rod. The piezoelectric transducer is for generating megasonic energy. The energy transfer rod installed over the wafer along a radial direction of the wafer is for distributing the megasonic energy to cleaning solution over the wafer and for vibrating the cleaning solution. The energy transfer rod is shaped and sized to uniformly distribute energy in the radial direction of the wafer through the cleaning solution to remove the contamination particles from the wafer.
REFERENCES:
patent: 2806328 (1957-09-01), Bradfield
patent: 2889580 (1959-06-01), Wald, Jr. et al.
patent: 2891178 (1959-06-01), Elmore
patent: 2891180 (1959-06-01), Elmore
patent: 3088343 (1963-05-01), Kuris et al.
patent: 3103310 (1963-09-01), Lang
patent: 3325348 (1967-06-01), Bennett
patent: 3375820 (1968-04-01), Kuris et al.
patent: 4131505 (1978-12-01), Davis, Jr.
patent: 4144882 (1979-03-01), Takemoto et al.
patent: 4176454 (1979-12-01), Hatter et al.
patent: 4302485 (1981-11-01), Last et al.
patent: 4504264 (1985-03-01), Kelman
patent: 4607185 (1986-08-01), Elbert et al.
patent: 4757227 (1988-07-01), Danley et al.
patent: 5390013 (1995-02-01), Snelling
patent: 5975094 (1999-11-01), Shurtliff
patent: 6021785 (2000-02-01), Grutzediek et al.
patent: 6039059 (2000-03-01), Bran
patent: 6140744 (2000-10-01), Bran
patent: 6165150 (2000-12-01), Banko
patent: 6679272 (2004-01-01), Bran et al.
patent: 6723110 (2004-04-01), Timm et al.
patent: 6754980 (2004-06-01), Lauerhaas et al.
patent: 2003/0141784 (2003-07-01), Bran
patent: 2003/0200986 (2003-10-01), Yeo et al.
patent: 64-27550 (1989-01-01), None
Hah Sang-rok
Jo Hyun-ho
Kim Kyung-hyun
Nam Jeong-lim
Yeo In-jun
F. Chau & Associates LLC
Samsung Electronics., Co.,Ltd.
Stinson Frankie L.
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