Measurement of overlay offset in semiconductor processing

Details Measurement of overlay offset in semiconductor processing Measurement of overlay offset in semiconductor processing

2007-03-14

2010-12-28

Garber, Charles D (Department: 2812)

Semiconductor device manufacturing: process

With measuring or testing

Optical characteristic sensed

C356S399000, C356S400000, C356S401000, C430S022000, C430S030000

Reexamination Certificate

active

07858404

ABSTRACT:
A method of semiconductor manufacturing including forming an overlay offset measurement target including a first feature on a first layer and a second feature on a second layer. The first feature and the second feature have a first predetermined overlay offset. The target is irradiated. The reflectivity of the irradiated target is determined. An overlay offset for the first layer and the second layer is calculated using the determined reflectivity.

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