Masking techniques and templates for dense semiconductor...

Details Masking techniques and templates for dense semiconductor... Masking techniques and templates for dense semiconductor...

2011-08-23

2011-08-23

Duda, Kathleen (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

C430S320000, C430S324000, C430S256000

Reexamination Certificate

active

08003310

ABSTRACT:
A template comprising pitch multiplied and non-pitch multiplied features is configured for use in imprint lithography. On a first substrate, a first pattern is formed using pitch multiplication and a second pattern is formed using photolithography without pitch multiplication. The first pattern and the second pattern are transferred to a template. The template is brought into contact with a transfer layer overlying a series of mask layers overlying a second substrate. The pitch multiplied and non-pitch multiplied patterns on the template are transferred to the transfer layer, forming an imprinted pattern. The imprinted pattern is transferred to the second substrate to form pitch multiplied and non-pitch multiplied features.

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