X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1997-02-06
1998-12-29
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Lithography
378208, H01L 2130
Patent
active
058548190
ABSTRACT:
There is disclosed a mask supporting device comprising a chuck mechanism for supporting a mask substrate provided with a rectangular window in which a mask pattern is formed, and a frame for reinforcing the mask substrate, and a mechanism for applying, to said frame of the mask, loads from mutually orthogonal directions. The mechanism for applying loads includes a fixed reference contacting two positions on the external periphery of the mask frame and two pressing mechanism for applying loads to the mask frame from two directions respectively opposed to the two contact positions.
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Chiba Yuji
Hara Shin-ichi
Kasumi Kazuyuki
Miyachi Takeshi
Mizusawa Nobutoshi
Canon Kabushiki Kaisha
Porta David P.
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