Mask patterns including gel layers for semiconductor device...

Details Mask patterns including gel layers for semiconductor device... Mask patterns including gel layers for semiconductor device...

2011-07-26

2011-07-26

Kelly, Cynthia H (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S270100, C430S014000

Reexamination Certificate

active

07985529

ABSTRACT:
Mask patterns include a resist pattern and a gel layer on a surface of the resist pattern having a junction including hydrogen bonds between a proton donor polymer and a proton acceptor polymer. Methods of forming the mask patterns and methods of fabricating a semiconductor device using the mask patterns as etching masks are also provided.

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