Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-07-21
2010-12-14
Lee, Sin J. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S311000, C430S313000, C430S317000, C430S330000, C430S005000, C430S009000, C430S014000, C430S015000, C430S018000
Reexamination Certificate
active
07851125
ABSTRACT:
Provided are a mask pattern including a silicon-containing self-assembled molecular layer, a method of forming the same, and a method of fabricating a semiconductor device. The mask pattern includes a resist pattern formed on a semiconductor substrate and the self-assembled molecular layer formed on the resist pattern. The self-assembled molecular layer has a silica network formed by a sol-gel reaction. To form the mask pattern, first, the resist pattern is formed with openings on an underlayer covering the substrate to expose the underlayer to a first width. Then, the self-assembled molecular layer is selectively formed only on a surface of the resist pattern to expose the underlayer to a second width smaller than the first width. The underlayer is etched by using the resist pattern and the self-assembled molecular layer as an etching mask to obtain a fine pattern.
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Chinese Office Action dated Apr. 10, 2009 in corresponding Chinese Appln. No. 2005100874497.
Hah Jung-Hwan
Hong Jin
Kim Hyun-Woo
Mitsuhiro Hata
Subramanya Kolake Mayya
F. Chau & Associates LLC
Lee Sin J.
Samsung Electronics Co,. Ltd.
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