Mask inspecting apparatus

Image analysis – Histogram processing – For setting a threshold

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

340721, 340723, 340732, 382 61, G06K 900, G09G 116

Patent

active

048706930

ABSTRACT:
A pattern forming apparatus for inverting at least one of plural patterns according to numerical design data respectively representing the plural patterns and synthesizing thus inverted pattern with the remainder of the plural patterns, comprises first operation device for attaching a flag of a positive image to the design data of uninverted patterns, and attaching a flag of an inverted image to the design data of inverted patterns, second operation device for handling the entire area of either inverted patterns or uninverted ones among the plural patterns as a single pattern, and attaching a corresponding flag to the design data of the pattern, and image forming device for forming image data of the area according to the data of the second operation device and then forming image data of each pattern according to the data of the first operation device.

REFERENCES:
patent: 4295135 (1981-10-01), Sukonick
patent: 4692758 (1987-09-01), Fawcett et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Mask inspecting apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Mask inspecting apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask inspecting apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-193395

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.