Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With gas inlet structure
Reexamination Certificate
2011-07-12
2011-07-12
Kackar, Ram N (Department: 1716)
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With gas inlet structure
C118S715000, C118S7230AN, C118S7230ER, C118S7230IR, C118S7230AN, C156S345290, C156S345340, C156S345480
Reexamination Certificate
active
07976671
ABSTRACT:
A plasma reactor for processing a workpiece such as a mask or wafer includes a vacuum chamber having a cylindrical side wall, a ceiling overlying the side wall and a ring supported on a top edge of the side wall and supporting the ceiling, the ring comprising an external surface and an interior surface. An RF plasma source power applicator and an RF source power generator coupled to the applicator furnish plasma source power. Plural passages extend in a radial direction through the ring from the external surface to the interior surface and are spaced apart along a circumference of the ring. A process gas supply furnishes process gas. An external gas flow conduit apparatus outside of the chamber extends around a circumference of the chamber and is coupled to the process gas supply. Plural external gas flow valves outside of the chamber are coupled to the external conduit at respective locations spaced apart along the conduit, each of the valves having: (a) a controlled gas output port coupled to a respective one of the plural passages at the external surface of the ring and (b) a valve control input. A gas valve configuration controller controls the valve control input of each of the valves.
REFERENCES:
patent: 4558845 (1985-12-01), Hunkapiller
patent: 5074456 (1991-12-01), Degner et al.
patent: 5083590 (1992-01-01), Gattolliat et al.
patent: 5269847 (1993-12-01), Anderson et al.
patent: 5419924 (1995-05-01), Nagashima et al.
patent: 5522934 (1996-06-01), Suzuki et al.
patent: 5534231 (1996-07-01), Savas
patent: 5620523 (1997-04-01), Maeda et al.
patent: 5658418 (1997-08-01), Coronel et al.
patent: 5717294 (1998-02-01), Sakai et al.
patent: 5724144 (1998-03-01), Muller et al.
patent: 5772771 (1998-06-01), Li et al.
patent: 5866198 (1999-02-01), Sato et al.
patent: 5876119 (1999-03-01), Ishikawa et al.
patent: 5879128 (1999-03-01), Tietz et al.
patent: 5885358 (1999-03-01), Maydan et al.
patent: 5948168 (1999-09-01), Shan et al.
patent: 6217937 (2001-04-01), Shealy
patent: 6228438 (2001-05-01), Schmitt
patent: 6239403 (2001-05-01), Dible et al.
patent: 6263829 (2001-07-01), Schneider et al.
patent: 6353210 (2002-03-01), Norrhakhsh et al.
patent: 6363882 (2002-04-01), Hao et al.
patent: 6388382 (2002-05-01), Doi et al.
patent: 6412437 (2002-07-01), Campbell et al.
patent: 6413867 (2002-07-01), Sarfaty et al.
patent: 6449871 (2002-09-01), Kholodenko et al.
patent: 6458495 (2002-10-01), Tsai et al.
patent: 6557593 (2003-05-01), Siegele et al.
patent: 6806653 (2004-10-01), Strang et al.
patent: 6829056 (2004-12-01), Barnes et al.
patent: 6896737 (2005-05-01), Sandhu
patent: 6961131 (2005-11-01), Usui et al.
patent: 7271096 (2007-09-01), Sandhu
patent: 7537672 (2009-05-01), Kushiishi et al.
patent: 2001/0054483 (2001-12-01), Collins et al.
patent: 2002/0000198 (2002-01-01), Ishikawa et al.
patent: 2002/0009814 (2002-01-01), Usui et al.
patent: 2002/0101167 (2002-08-01), Shan et al.
patent: 2002/0146512 (2002-10-01), Rossman
patent: 2002/0192369 (2002-12-01), Morimoto et al.
patent: 2003/0005958 (2003-01-01), Rocha-Alvarez et al.
patent: 2003/0029564 (2003-02-01), Brown et al.
patent: 2003/0070620 (2003-04-01), Cooperberg et al.
patent: 2003/0124820 (2003-07-01), Johnsgard et al.
patent: 2003/0129835 (2003-07-01), Kholodenko et al.
patent: 2003/0137250 (2003-07-01), Mitrovic
patent: 2003/0141795 (2003-07-01), Strang et al.
patent: 2003/0151272 (2003-08-01), Tsuchiya et al.
patent: 2003/0155079 (2003-08-01), Bailey et al.
patent: 2003/0176000 (2003-09-01), Otsubo et al.
patent: 2004/0025787 (2004-02-01), Selbrede et al.
patent: 2004/0062874 (2004-04-01), Kim et al.
patent: 2004/0108068 (2004-06-01), Senzaki et al.
patent: 2004/0261712 (2004-12-01), Hayashi et al.
patent: 2005/0051271 (2005-03-01), Collins et al.
patent: 2005/0082007 (2005-04-01), Nguyen et al.
patent: 2005/0095779 (2005-05-01), Usuami
patent: 2005/0241583 (2005-11-01), Buechel et al.
patent: 2005/0263247 (2005-12-01), Samukawa et al.
patent: 2006/0043067 (2006-03-01), Kadkhodayan et al.
patent: 2006/0073683 (2006-04-01), Collins et al.
patent: 2006/0191638 (2006-08-01), Dalton et al.
patent: 2006/0219362 (2006-10-01), Han et al.
patent: 2007/0048869 (2007-03-01), Lee et al.
patent: 2007/0075037 (2007-04-01), Chang et al.
patent: 2007/0166477 (2007-07-01), Chang
patent: 051360981 (1993-06-01), None
patent: 10298787 (1998-11-01), None
patent: 2000200783 (2000-07-01), None
patent: 2002246368 (2002-08-01), None
patent: 100147634 (1998-05-01), None
patent: WO9702589 (1997-01-01), None
patent: WO 99/62099 (1999-02-01), None
patent: WO0150497 (2001-07-01), None
Official Action Dated May 18, 2010, Issued in Co-Pending U.S. Appl. No. 11/589,598.
Official Action Dated May 19, 2010, Issued in Co-Pending U.S. Appl. No. 11/589,476.
Offical Action Dated May 27, 2010, Issued in Co-Pending U.S. Appl. No. 11/589,596.
Official Action Dated Jun. 22, 2010 Issued in Co-Pending U.S. Appl. No. 11/589,652.
Official Action Dated Jun. 23, 2010 Issued in Co-Pending U.S. Appl. No. 11/589,477.
U.S. Appl. No. 11/589,343, Richard Lewington et al., filed Oct. 30, 2006.
U.S. Appl. No. 11/589,598, Madhavi Chandrachood, Oct. 30, 2006.
U.S. Appl. No. 11/589,477, Madhavi Chandrachood, Oct. 30, 2006.
U.S. Appl. No. 11/589,337, Richard Lewington et al., Oct. 30, 2006.
U.S. Appl. No. 11/589,596, Richard Lewington et al., Oct. 30, 2006.
U.S. Appl. No. 11/589,476, Richard Lewington et al., Oct. 30, 2006.
U.S. Appl. No. 11/589,652, Richard Lewington et al., Oct. 30, 2006.
Official Communication Dated Oct. 30, 2009 in Co-Pending U.S. Appl. No. 11/589,343.
Official Communication Dated Sep. 21, 2009 in Co-Pending U.S. Appl. No. 11/589,598.
Official Communication Dated Sep. 24, 2009 in Co-Pending U.S. Appl. No. 11/589,577.
Official Communication Dated Jan. 6, 2010 Issued in Co-Pending U.S. Appl. No. 11/589,598.
Official Action Dated Dec. 7, 2010 Issued in Co-Pending U.S. Appl. No. 11/589,652.
Official Action Dated Dec. 8, 2010 Issued in Co-Pending U.S. Appl. No. 11/589,343.
Official Action Dated Dec. 9, 2010 Issued in Co-Pending U.S. Appl. No. 11/589,477.
Official Action Dated Dec. 10, 2010 Issued in Co-Pending U.S. Appl. No. 11/589,337.
Offical Action Dated Aug 4, 2010, Issued in Co-Pending U.S. Appl. No. 11/589,596.
Official Action Dated Apr. 23, 2010 Issued in Co-Pending U.S. Appl. No. 111589,476.
Official Action Dated Apr. 26, 2010 Issued in Co-Pending U.S. Appl. No. 11/589,343.
Official Action Dated Apr. 28, 2010 Issued in Co-Pending U.S. Appl. No. 11/589,337.
Official Action Dated Mar. 29, 2011 Issued in Co-Pending U.S. Appl. No. 11/589,598.
Official Action Dated Mar. 30, 2011 Issued in Co-Pending U.S. Appl. No. 11/589,478.
European Search Report Dated May 27, 2010 Issued in Corresponding European Patent Application No. 07014341.7-1226.
Official Communication Dated Aug. 31, 2009 in Co-Pending U.S. Appl. No. 11/589,652.
Chandrachood Madhavi R.
Grimbergen Michael N.
Ibrahim Ibrahim M.
Kumar Ajay
Lewington Richard
Applied Materials Inc.
Chandra Satish
Kackar Ram N
Wallace Robert M.
LandOfFree
Mask etch plasma reactor with variable process gas distribution does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Mask etch plasma reactor with variable process gas distribution, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask etch plasma reactor with variable process gas distribution will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2706557