Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2005-01-03
2010-02-02
Huff, Mark F (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S005000, C430S311000
Reexamination Certificate
active
07655388
ABSTRACT:
A chromeless phase shift mask and Method for making and using. The A chromeless phase shift mask is used to pattern contact holes. The chromeless phase shift mask preferably comprises: a first phase shift region and a second phase shift region; the first region is comprised of a unit cell which is comprised of a rectangular center section and at least three rectangular sections (legs) outwards extending from the rectangular center section. The second region is adjacent to said first region. The interference between the first and second phase shift regions creates a contact hole pattern.
REFERENCES:
patent: 5273850 (1993-12-01), Lee et al.
patent: 5397663 (1995-03-01), Uesawa et al.
patent: 5487963 (1996-01-01), Sugawara
patent: 5786115 (1998-07-01), Kawabata et al.
patent: 5863712 (1999-01-01), Von Bunau et al.
patent: 6376130 (2002-04-01), Stanton
patent: 6623895 (2003-09-01), Chen et al.
patent: 7312020 (2007-12-01), Lin et al.
patent: 2002/0177048 (2002-11-01), Saitoh et al.
patent: 2003/0203291 (2003-10-01), Misaka
patent: 2004/0101765 (2004-05-01), Sivakumar et al.
Chong Hury Ming
Hsia Liang Choo
Lin Qun Ying
Tan Sia Kim
Tan Soon Yoeng
Chartered Semiconductor Manufacturing Ltd.
Fraser Stewart A
Horizon IP Pte Ltd
Huff Mark F
LandOfFree
Mask and method to pattern chromeless phase lithography... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Mask and method to pattern chromeless phase lithography..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask and method to pattern chromeless phase lithography... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4188683