Mask analysis

Details Mask analysis Mask analysis

1978-03-08

1980-08-19

Corbin, John K.

Optics: measuring and testing

By configuration comparison

With comparison to master, desired shape, or reference voltage

250563, 250572, 356431, 356239, G01N 2132

Patent

active

042181429

ABSTRACT:
Masks used in the production of integrated circuits are analyzed and tested by a scanning spot from a laser beam comparing the position signal of the scan from a mask against a data base representing another mask which may be selected at random. Apparatus includes a laser, means to form and scan a minute spot from said laser, an x-y stage to move a mask under the scan, a detector, and means to compare scan results.

REFERENCES:
Bruning et al., "An Automated Mask Inspection System--AMIS" IEEE Trans. on Electron Devices, vol. ED-22, No. 7, pp. 487-495, 7/75.
Thomas, "Defect Scanner for Repetitive Patterns", IBM Tech. Discl. Bull., vol. 16, No. 10, p. 3158, 3/74.

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