Active solid-state devices (e.g. – transistors – solid-state diode – Alignment marks
Reexamination Certificate
2004-11-12
2009-12-08
Thai, Luan C (Department: 2891)
Active solid-state devices (e.g., transistors, solid-state diode
Alignment marks
C257SE23179, C438S401000, C438S462000, C356S401000
Reexamination Certificate
active
07629697
ABSTRACT:
The invention includes a lithographic system having a first source for generating radiation with a first wavelength and an alignment system with a second source for generating radiation with a second wavelength. The second wavelength is larger than the first wavelength. A marker structure is provided having a first layer and a second layer. The second layer is present either directly or indirectly on top of said first layer. The first layer has a first periodic structure and the second layer has a second periodic structure. At least one of the periodic structures has a plurality of features in at least one direction with a dimension smaller than 400 nm. Additionally, a combination of the first and second periodic structure forms a diffractive structure arranged to be illuminated by radiation with the second wavelength.
REFERENCES:
patent: 6417922 (2002-07-01), Dirksen et al.
patent: 6819426 (2004-11-01), Sezginer et al.
patent: 6937344 (2005-08-01), Monshouwer et al.
patent: 7193715 (2007-03-01), Smedt et al.
patent: 7230704 (2007-06-01), Sezginer et al.
patent: 2002/0149782 (2002-10-01), Raymond
patent: 2003/0224261 (2003-12-01), Schulz
patent: 2004/0137651 (2004-07-01), Smedt et al.
patent: 2004/0229471 (2004-11-01), Abdulhalim et al.
patent: 2004-279405 (2004-10-01), None
patent: WO 02/25723 (2002-03-01), None
patent: WO 02/084213 (2002-10-01), None
patent: 2004/107415 (2004-12-01), None
English translation of Japanese Official Action issued on Dec. 11, 2008 in Japanese Application No. 2005-327563.
Burghoorn Jacobus
Den Boef Arie Jeffrey
Rijpers Bartolomeus Petrus
Van Der Schaar Maurits
Van Haren Richard Johannes Franciscus
ASML Netherlands B.V.
Pillsbury Winthrop Shaw & Pittman LLP
Thai Luan C
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