Powder metallurgy processes – Powder metallurgy processes with heating or sintering – Metal and nonmetal in final product
Patent
1995-06-07
1996-12-31
Jordan, Charles T.
Powder metallurgy processes
Powder metallurgy processes with heating or sintering
Metal and nonmetal in final product
419 19, 419 33, 419 39, 419 45, B22F 100
Patent
active
055903851
ABSTRACT:
A manufacturing method of a target for sputtering comprises the steps of: compressing first and second oxide powders with high permeability to form first and second compressed materials, respectively; sintering the first and the second compressed materials to form a sintered body made of a third oxide crystal; pulverizing the sintered body made of the third oxide crystal to form a third oxide powder; mixing the third oxide powder and titanium powder and compressing the mixed powder to form a third compressed material; and sintering the third compressed material in a vacuum condition to form an oxide target. This manufacturing method produces a target which can stably form oxide thin film with high permeability at high voltage for a long time and can be applied to a direct current sputtering process.
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patent: 4915738 (1990-04-01), Morimoto et al.
patent: 5098649 (1992-03-01), Matsumoto et al.
patent: 5338721 (1994-08-01), Yamamoto et al.
patent: 5447801 (1995-09-01), Masuda et al.
Chi Anthony R.
Jordan Charles T.
Samsung Electronics Co,. Ltd.
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