Manufacturing method of semiconductor device and...

Details Manufacturing method of semiconductor device and... Manufacturing method of semiconductor device and...

2005-07-05

2005-07-05

Lee, Hsien-Ming (Department: 2823)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

C438S227000, C438S296000, C438S424000, C438S696000, C438S724000

Reexamination Certificate

active

06913962

ABSTRACT:
A manufacturing method of a semiconductor device disclosed herein, comprises: forming a buried insulating film in a semiconductor substrate; forming semiconductor elements isolated by the buried insulating film; cleaning a surface side of the semiconductor substrate with a cleaning solution; and covering a surface side of the buried insulating film with a protective film before the step of cleaning the surface side of the semiconductor substrate, wherein a protective film is resistant to the cleaning solution.

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