Manufacturing method of optical diffraction grating element with

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Light scattering or refractive index image formation

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430299, 430321, 359566, G03C 500

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052799247

ABSTRACT:
The method of manufacturing an optical diffraction grating element of the present invention is characterized in adopting an ion beam made from a gas chemically reacting with a glass substrate when forming a diffraction grating having a serrated profile upon the glass substrate through an ion beam etching method. Also, when manufacturing an optical diffraction grating element that is divided into a plurality of regions whereon diffraction gratings having different diffraction angles with respect to an incident light are provided, the method of the present invention is characterized in forming slits into a resist film disposed upon a transparent substrate such as a glass substrate, in accordance with the patterns of the diffraction gratings, such that the width of the slits is constant irrespectively of the regions. Accordingly, the method of manufacturing an optical diffraction grating element of the present invention enables to improve the diffraction efficiency of the optical diffraction grating element, and to enhance the optical efficiency of an optical head device. The SN ratio of the output signals released by the optical head device may be thus improved and the servo error control executed accurately.

REFERENCES:
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patent: 4806454 (1989-02-01), Yoshida et al.
patent: 4842969 (1989-06-01), Kawatsuki et al.
patent: 4895790 (1990-01-01), Swanson et al.
Blazing of Holographic Grating by Ion Etching Technique Japan J. Appl. Phys. vol. 15 (1976), No. 4.
"Ion-etched High-efficiency Holographic Component" in published in Report of the Autumn Science Lecture Meeting of the Precision Engineering Society (Sep. 30, 1990) by Yukio Kurata et al.
"Holographic CD Pickup" in Report of the Autumn Science Lecture Meeting of the Precision Engineering Society (1989) by Katsuhiro Kubo, et al.
"Optical Properties of Blazed Ion-etched Holographic Grating" Applied Physics, vol. 48, No. 6 (1979), 539 by Kazuo Sano et al.
Ion-Etched Blazed Holographic Zone Plates by K. Kosuge et al., ICO-13 Conference Digest, Aug. 1984.
"A Blazed Grating Fabricated by Sychrotron Radiation Lithography" Japanese Journal of Applied Physics, vol. 25, No. 10, Oct. 1986.

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