Manufacturing method for donor film with improved surface...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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C430S200000, C430S935000

Reexamination Certificate

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11520467

ABSTRACT:
A manufacturing method using an additional heat-treatment process for a donor film with improved surface roughness. The improved donor film, used in a laser induced thermal imaging method, is capable of enhancing the lifetime of products and reducing the defect rates thereof. A manufacturing method for a donor film according to the invention, includes: providing a donor film comprising a base film, a light-to-heat conversion layer and an organic film; heating the donor film to provide a heat-treated donor film; and cooling the heat-treated donor film. The surface roughness of a donor film can be improved, and the non-uniform distribution of a laser on a region subjected to the LITI process can be minimized to prevent the over- or under-transfer of an transferred organic film, etc., and the non-uniform adhesion of the transferred organic film with an acceptor substrate.

REFERENCES:
patent: 5998085 (1999-12-01), Isberg et al.
patent: 6051318 (2000-04-01), Kwon
patent: 6214520 (2001-04-01), Wolk et al.
patent: 6326121 (2001-12-01), Takahashi
patent: 2003/0157425 (2003-08-01), Kawase
patent: 2000-0034508 (2000-06-01), None
Korean Patent Abstract for Korean Publication No. 1020000034508 A, published Jun. 26, 2000 in the name of Chun Geun Cho.

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