Manufacturing apparatus for semiconductor device and...

Details Manufacturing apparatus for semiconductor device and... Manufacturing apparatus for semiconductor device and...

2011-06-28

2011-06-28

Wilczewski, Mary (Department: 2822)

Coating apparatus

Gas or vapor deposition

Work support

C118S725000

Reexamination Certificate

active

07967912

ABSTRACT:
A manufacturing apparatus for a semiconductor device, includes: a reaction chamber to which a wafer w is loaded; a gas supply port for supplying first process gas including source gas from an upper portion of the reaction chamber; a first rectifying plate for supplying the first process gas onto the wafer in a rectifying state; a first gas exhaust port for exhausting gas from a lower portion of the reaction chamber; a second gas exhaust port for exhausting gas from the upper portion of the reaction chamber; a heater for heating the wafer w; a susceptor for retaining the wafer w; and a rotation drive unit for rotating the wafer w.

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