Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-02-22
2005-02-22
Ashton, Rosemary (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S905000, C430S907000, C526S242000, C526S262000, C526S281000
Reexamination Certificate
active
06858371
ABSTRACT:
Photoresist monomers, photoresist polymers prepared thereof, and photoresist compositions using the polymer are disclosed. More specifically, photoresist polymers comprising maleimide monomer represented by Formula 1, and a composition comprising the polymer thereof are disclosed. The photoresist composition has excellent etching resistance, heat resistance and adhesiveness, and can be developed in an aqueous tetramethylammonium hydroxide (TMAH) solution. As the composition has low light absorbance at 193 nm and 157 nm wavelength, and it is suitable for a process using ultraviolet light source such as VUV (157 nm)wherein, X1, X2, R1, R2and R3are defined in the specification.
REFERENCES:
patent: 3658843 (1972-04-01), Kleiner
patent: 5059513 (1991-10-01), Hopf et al.
patent: 5558978 (1996-09-01), Schadeli et al.
patent: 6316565 (2001-11-01), Jung et al.
patent: 6406828 (2002-06-01), Szmanda et al.
patent: 07207021 (1995-08-01), None
Jung Jae Chang
Jung Min Ho
Koh Cha Won
Lee Geun Su
Shin Ki Soo
Ashton Rosemary
Hynix / Semiconductor Inc.
LandOfFree
Maleimide-photoresist monomers containing halogen, polymers... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Maleimide-photoresist monomers containing halogen, polymers..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Maleimide-photoresist monomers containing halogen, polymers... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3444540