Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – Having glow discharge electrode gas energizing means
Reexamination Certificate
2003-06-10
2011-11-01
Alejandro, Luz L. (Department: 1716)
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
Having glow discharge electrode gas energizing means
C118S7230ER
Reexamination Certificate
active
08048260
ABSTRACT:
The present invention provides a magnetic neutral line discharge plasma processing system that can apply a plurality of linear magnetic neutral line discharge plasmas simultaneously so as to uniformly process all the surface area of a large rectangular substrate for homogeneousness. The management field generating means of the magnetic neutral line discharge plasma processing system has at least two linear current rods arranged outside the vacuum chamber in parallel with the surface to be processed of the object of processing in the vacuum chamber so as to form at least a linear magnetic neutral line in the vacuum chamber between adjacently located linear current rods.
REFERENCES:
patent: 4838978 (1989-06-01), Sekine et al.
patent: 4963242 (1990-10-01), Sato et al.
patent: 5272417 (1993-12-01), Ohmi
patent: 5527394 (1996-06-01), Heinrich et al.
patent: 5571366 (1996-11-01), Ishii et al.
patent: 5690781 (1997-11-01), Yoshida et al.
patent: 5733405 (1998-03-01), Taki et al.
patent: 5897712 (1999-04-01), Hanawa et al.
patent: 5965034 (1999-10-01), Vinogradov et al.
patent: 6028395 (2000-02-01), Holland et al.
patent: 6077384 (2000-06-01), Collins et al.
patent: 6155199 (2000-12-01), Chen et al.
patent: 6268700 (2001-07-01), Holland et al.
patent: 6320320 (2001-11-01), Bailey et al.
patent: 2003/0168172 (2003-09-01), Glukhoy
patent: 2705897 (1997-09-01), None
patent: 3177573 (2001-04-01), None
Alejandro Luz L.
Haeberlin Jeffrey A.
Stites & Harbison PLLC
ULVAC Inc.
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