Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1985-07-24
1986-07-15
Demers, Arthur P.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
156345, 156643, 204192E, 204192EC, C23C 1500
Patent
active
046004920
ABSTRACT:
A plurality of bar-like magnets are arranged in a vacuum chamber at an equal space interval to form a plurality of strong magnetic fields in a stripe-pattern form and the magnets are moved reciprocally in the direction of arrangement of the magnetic fields while changing gradually the stop points of the magnets over a work to be processed by etching or sputtering in a step-like manner so that the integral effect of each magnetic field acting on the work is uniform over the entire region of the work.
REFERENCES:
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patent: 4422916 (1983-12-01), McKelvey
patent: 4426264 (1984-01-01), Munz et al.
patent: 4431473 (1984-02-01), Okano et al.
patent: 4444635 (1984-04-01), Kobayashi et al.
patent: 4498969 (1985-02-01), Ramachandran
patent: 4544468 (1985-10-01), Munz et al.
patent: 4552639 (1985-11-01), Garrett
Aikawa Tetsuo
Jo Hidetaka
Okano Haruo
Ooshio Hirosuke
Yamazaki Takashi
Demers Arthur P.
Kabushiki Kaisha Tokuda Seisakusho
Kabushiki Kaisha Toshiba
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