Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2011-07-05
2011-07-05
Nguyen, Nam X (Department: 1724)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C204S298210, C204S298190, C156S345100
Reexamination Certificate
active
07972486
ABSTRACT:
A machine for coating a transparent substrate for the production of display screens comprises a coating chamber that has a modular design. Each of the modules1features a chamber section2, a first support3that is arranged removably in or at the chamber section2, and a second support4that is arranged removably at the first support3. Whereas the first support3bears the cathodes, the second support4is formed as a cover at which are arranged the pumps for producing a vacuum in the coating chamber. Carriers3and4can be removed laterally from the chamber section2to such an extent that areas11a,11baccessible to persons can be formed between the module components. In this way, the components of the machine are readily accessible, for example for maintenance purposes. Work can be done simultaneously on the cathodes and in the chamber interior.
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Buchberger Hans
Geiss Andreas
Haas Dieter
Krempel-Hesse Jörg
Applied Materials GmbH & Co. KG
Berman Jason M
Kulish Christopher J.
Nguyen Nam X
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