Lower liner with integrated flow equalizer and improved...

Details Lower liner with integrated flow equalizer and improved... Lower liner with integrated flow equalizer and improved...

2011-08-02

2011-08-02

Zervigon, Rudy (Department: 1716)

Coating apparatus

Gas or vapor deposition

With treating means

C156S345100

Reexamination Certificate

active

07987814

ABSTRACT:
A plasma processing chamber has a lower liner with an integrated flow equalizer. In an etching process, the processing gases may be unevenly drawn from the processing chamber which may cause an uneven etching of the substrate. The integrated flow equalizer is configured to equalize the flow of the processing gases evacuated from the chamber via the lower liner.

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