Low voltage high performance semiconductor devices and methods

Details Low voltage high performance semiconductor devices and methods Low voltage high performance semiconductor devices and methods

2005-09-20

2005-09-20

Lebentritt, Michael (Department: 2812)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

C438S258000, C438S275000

Reexamination Certificate

active

06946353

ABSTRACT:
A method for adjusting Vtwhile minimizing parasitic capacitance for low voltage high speed semiconductor devices. The method uses shadow effects and an angled punch through prevention implant between vertical structures to provide a graded implant. The implant angle is greater than or equal to arc tangent of S/H where S is the horizontal distance between, and H is the height of, such vertical structures.

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