Low voltage electrostatic clamp for substrates such as dielectri

Details Low voltage electrostatic clamp for substrates such as dielectri Low voltage electrostatic clamp for substrates such as dielectri

1995-12-22

1998-11-17

Fleming, Fritz

Electricity: electrical systems and devices

Electric charge generating or conducting means

Use of forces of electric charge or field

279128, H02N 1300

Patent

active

058385290

ABSTRACT:
An electrostatic clamp for dielectric substrates is operated with a low voltage electric source by reducing the width of electrode lines to less than 100 .mu.m and by reducing the spacing between adjacent electrode lines to less than 100 .mu.m. The electrostatic clamp includes an array of electrodes such as aluminum formed on a base of insulating material such as glass and covered by an insulating layer such as nitride which covers and protects the electrodes. Electrical contacts apply voltages of opposite polarities to alternating electrode lines to create a non-uniform electric field which causes a dielectric substrate to be pulled toward the region of highest electric field. The reduced width electrode lines and spacings are created by the use of micro-lithographic techniques including thin film deposition and etching for formation of the electrode and the coating layers.

REFERENCES:
patent: 3634740 (1972-01-01), Stevko
patent: 3916270 (1975-10-01), Wachtler et al.
patent: 4184188 (1980-01-01), Briglia
patent: 4340462 (1982-07-01), Koch
patent: 4384918 (1983-05-01), Abe
patent: 4480284 (1984-10-01), Tojo et al.
patent: 4502094 (1985-02-01), Lewin et al.
patent: 4534816 (1985-08-01), Chen et al.
patent: 4551192 (1985-11-01), Di Milia et al.
patent: 4579618 (1986-04-01), Celestino et al.
patent: 4615755 (1986-10-01), Tracy et al.
patent: 4665463 (1987-05-01), Ward et al.
patent: 4692836 (1987-09-01), Suzuki
patent: 4724510 (1988-02-01), Wicker et al.
patent: 4948458 (1990-08-01), Ogle
patent: 4962441 (1990-10-01), Collins
patent: 5013400 (1991-05-01), Kurasaki et al.
patent: 5055964 (1991-10-01), Logan et al.
patent: 5160152 (1992-11-01), Toraguchi et al.
patent: 5191506 (1993-03-01), Logan et al.
patent: 5200232 (1993-04-01), Tappan et al.
patent: 5238499 (1993-08-01), van de Ven et al.
patent: 5262029 (1993-11-01), Erskine et al.
patent: 5315473 (1994-05-01), Collins et al.
patent: 5326725 (1994-07-01), Sherstinsky et al.
patent: 5350479 (1994-09-01), Collins et al.
Reactive Ion Etching Technology In Thin-Film-Transistor Processing, Y. Kuo, IBM J. Res. Develop., vol. 36, No. 1 (Jan. 1992), pp. 69-75.
GPI WEB Client abstract of JP357196211A to Ishikawa et al., Dec. 1982.

Affiliated with

Also associated with

Rating

Low voltage electrostatic clamp for substrates such as dielectri does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Low voltage electrostatic clamp for substrates such as dielectri, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Low voltage electrostatic clamp for substrates such as dielectri will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-890742